J.T.Baker® CLk™-168, Residue Remover

공급업체: Avantor
J.T.Baker® CLk™-168
5525-09EA 0 KRW
5525-09
J.T.Baker® CLk™-168, Residue Remover
세정제 Detergents and Surface Cleansers
CLk™-168 residue remover is designed to increase margin for line collapse in dense arrays and high-aspect ratio layouts. This offers significantly longer bath life over competitive formulations in conventional cleans.

CLk™-168 residue remover offers an aqueous based post-etch residue remover, compatibility with copper, dense and low-ĸ materials, short operating times:15 to 90 seconds for a single wafer process, low operating temperatures (starting at 25 °C), broad process latitude in multiple technology nodes from 130 nm and below, DI water rinse, improved bath life at elevated temperature (typically greater than 48 hours), flexibility for use in bath, batch spray, and single wafer tools and excellent cleaning of silicon, copper oxide, titanium fluoride rich residues.
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